| CPC F25B 41/20 (2021.01) [F25B 49/02 (2013.01); F25B 2313/02732 (2013.01); F25B 2600/2519 (2013.01)] | 7 Claims |
|
1. A chiller system that circulates refrigerant between a wafer mounting base and a chiller unit, comprising:
an internal circulation path configured to allow circulation of the refrigerant inside the chiller unit;
an external circulation path configured to allow circulation of the refrigerant between the chiller unit and the wafer mounting base; and
a control device configured to control the chiller unit, wherein
the internal circulation path is equipped with a refrigerant tank, an internal circulation pump, and a refrigerator,
the external circulation path includes a feed path extending from the chiller unit to the wafer mounting base and a return path returning to the chiller unit from the wafer mounting base,
the feed path is equipped with an external circulation pump and a temperature sensor,
the return path includes a communication path that provides communication between the return path and the refrigerant tank,
the communication path is equipped with throttle part configured to limit a flow rate of the refrigerant flowing into the refrigerant tank,
the internal circulation path includes an on-off control valve provided upstream of the refrigerant tank,
the chiller system further comprises a pressurizing path for pressurizing the refrigerant flowing through the return path, with one end of the pressurizing path being connected to an upstream side of the on-off control valve in the internal circulation path and the other end of the pressurizing path being connected to an upstream side of the throttle part in the communication path, and
the control device controls operation of the on-off control valve based on a set temperature value or a measurement result of the temperature sensor.
|