US 12,173,736 B2
Gas transport system
Jheng-Syun Li, Hsinchu (TW); and Mao-Chou Huang, Hsinchu (TW)
Assigned to Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Aug. 4, 2023, as Appl. No. 18/365,776.
Application 18/365,776 is a continuation of application No. 17/097,820, filed on Nov. 13, 2020, granted, now 11,971,057.
Prior Publication US 2023/0407893 A1, Dec. 21, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. F15D 1/06 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01)
CPC F15D 1/06 (2013.01) [C23C 16/4412 (2013.01); C23C 16/45519 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01L 21/67017 (2013.01); H01J 37/32082 (2013.01); H01J 2237/3321 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A gas curtain device comprising:
a conduit liner, the conduit liner including a spiral vent passing though the conduit liner, wherein the spiral vent has a width W1 measured along length of the conduit liner near a conduit joint and the spiral vent has a width W2 measured along the length of the conduit liner at a location that is further from the conduit joint than a location where W1 is measured, W2 being larger than W1; and
the conduit joint surrounding a portion of the conduit liner, the conduit joint including a plurality of gas inlet ports in fluid communication with the spiral vent of the conduit liner.