US 12,173,405 B2
Processing apparatus and processing method
Hiroki Iriuda, Yamanashi (JP); Yoichiro Chiba, Yamanashi (JP); and Atsushi Endo, Yamanashi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Sep. 13, 2021, as Appl. No. 17/472,891.
Claims priority of application No. 2020-155808 (JP), filed on Sep. 16, 2020.
Prior Publication US 2022/0081771 A1, Mar. 17, 2022
Int. Cl. C23C 16/455 (2006.01); C23C 16/52 (2006.01)
CPC C23C 16/45563 (2013.01) [C23C 16/45502 (2013.01); C23C 16/45544 (2013.01); C23C 16/45587 (2013.01); C23C 16/52 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A processing apparatus comprising:
a processing container having a substantially cylindrical shape and provided with an exhaust slit on a side wall;
a plurality of gas nozzles extending in a vertical direction along an inside of the side wall of the processing container and disposed symmetrically with respect to a straight line extending from a center of the exhaust slit to a portion of the side wall positioned opposite to the exhaust slit via a center of the processing container, the plurality of gas nozzles including both a gas nozzle disposed on the straight line and at least two other gas nozzles disposed on a same arc extending along an inner circumference of the processing container when viewed in a horizontal cross section,
at least one memory storing executable instructions; and
at least one processor configured to execute the executable instructions to:
control the plurality of gas nozzles including the gas nozzle disposed on the straight line to eject a same processing gas into the processing container.