US D1,008,986 S
Ion shield plate for plasma processing apparatus
Yusuke Nakatani, Tokyo (JP); Kazuumi Tanaka, Tokyo (JP); Masahiro Yamaoka, Tokyo (JP); Yasushi Sonoda, Tokyo (JP); and Taku Iwase, Tokyo (JP)
Assigned to Hitachi High-Tech Corporation, Tokyo (JP)
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
Filed on Oct. 25, 2021, as Appl. No. 29/789,929.
Claims priority of application No. 2021-008852 D (JP), filed on Apr. 26, 2021.
Term of patent 15 Years
LOC (14) Cl. 13 - 03
U.S. Cl. D13—182
OG exemplary drawing
 
The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.