US 11,856,336 B2
Projection mapping system and apparatus
Fielding B. Staton, Liberty, MO (US); and David Strumpf, Columbia, MO (US)
Assigned to Newtonold Technologies, L.L.C., Liberty, MO (US)
Filed by NEWTONOID TECHNOLOGIES, L.L.C., Liberty, MO (US)
Filed on Dec. 3, 2019, as Appl. No. 16/701,727.
Application 16/701,727 is a continuation in part of application No. 16/278,628, filed on Feb. 18, 2019, granted, now 10,495,961.
Application 16/278,628 is a continuation in part of application No. 16/036,772, filed on Jul. 16, 2018, granted, now 10,212,404, issued on Feb. 19, 2019.
Application 16/036,772 is a continuation in part of application No. 15/622,959, filed on Jun. 14, 2017, granted, now 10,027,937, issued on Jul. 17, 2018.
Claims priority of provisional application 62/782,311, filed on Dec. 19, 2018.
Prior Publication US 2020/0106998 A1, Apr. 2, 2020
Int. Cl. H04N 9/31 (2006.01); G01B 3/1061 (2020.01); G02B 27/01 (2006.01); G01B 3/1069 (2020.01)
CPC H04N 9/3152 (2013.01) [G01B 3/1061 (2013.01); G02B 27/0101 (2013.01); H04N 9/3194 (2013.01); G01B 3/1069 (2020.01); G02B 2027/011 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A marking and display system, comprising:
a scanning apparatus, comprising a processor in data communication with a networking device, at least one input/output device, and computer memory, the computer memory comprising a program having machine readable instructions that, when effected by the processor, perform the following steps:
(a) scan an area of interest for a first scan;
(b) determine the presence of at least one abnormality at the area of interest;
(c) provide a marking at an area substantially adjacent the at least one abnormality;
(d) develop a baseline scan of the area of interest based on the first scan;
(e) scan the area of interest for a second scan;
(f) compare the second scan to the first scan;
(g) determine a second abnormality based on the comparison at step (f); and
(h) provide a second marking substantially adjacent the second abnormality;
wherein at least one of the first marking and the second marking comprises a laser etch.