US 11,854,804 B2
Laser irradiation method and laser irradiation apparatus
Hiroshi Okumura, Seoul (KR); Jongjun Baek, Seoul (KR); and Dong-Sung Lee, Hwaseong-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-si (KR)
Filed on Dec. 22, 2021, as Appl. No. 17/559,415.
Application 17/559,415 is a division of application No. 16/592,087, filed on Oct. 3, 2019, granted, now 11,227,764.
Claims priority of application No. 10-2018-0155539 (KR), filed on Dec. 5, 2018.
Prior Publication US 2022/0115233 A1, Apr. 14, 2022
Int. Cl. H01L 21/02 (2006.01); H01L 21/67 (2006.01)
CPC H01L 21/02691 (2013.01) [H01L 21/67115 (2013.01); H01L 21/02678 (2013.01); H01L 21/02683 (2013.01); H01L 21/02686 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A laser irradiation apparatus for irradiating a laser beam onto a surface of a substrate arranged in a plane formed by an X direction and a Y direction perpendicular to the X direction, wherein a laser irradiation area irradiated with the laser beam is moved on the surface of the substrate along the Y direction, the laser irradiation apparatus comprising:
a laser light source for generating the laser beam;
a first lens through which the laser beam generated from the laser light source passes; and
a scanner which reflects the laser beam that has passed through the first lens and the scanner being to change a direction of the laser beam which is reflected, wherein
a converging angle of the laser beam (α) in the X direction is not more than 30 mrad, and
an incident angle (θ) of the laser beam, a divergence angle (θy) of the laser beam in the Y direction, and a tilt angle φ with respect to the substrate satisfy the following equation
θy [mrad]<9.33×θ[deg].  <equation>