US 11,852,970 B2
Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin
Hiroto Kudo, Suita (JP); Masatoshi Echigo, Tokyo (JP); Takumi Toida, Hiratsuka (JP); and Takashi Sato, Hiratsuka (JP)
Assigned to Mitsubishi Gas Chemical Company, Inc., Tokyo (JP); and A School Corporation Kansai University, Osaka (JP)
Appl. No. 15/754,794
Filed by Mitsubishi Gas Chemical Company, Inc., Tokyo (JP); and A SCHOOL CORPORATION KANSAI UNIVERSITY, Suita (JP)
PCT Filed Aug. 23, 2016, PCT No. PCT/JP2016/074563
§ 371(c)(1), (2) Date Feb. 23, 2018,
PCT Pub. No. WO2017/033943, PCT Pub. Date Mar. 2, 2017.
Claims priority of application No. 2015-165305 (JP), filed on Aug. 24, 2015.
Prior Publication US 2018/0246405 A1, Aug. 30, 2018
Int. Cl. G03F 7/004 (2006.01); C07C 395/00 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/038 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 395/00 (2013.01); G03F 7/004 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0382 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01)] 11 Claims
 
1. A composition for forming a film for lithography comprising:
a tellurium-containing compound or a tellurium-containing resin, the tellurium-containing compound or the tellurium-containing resin having an aryl structure which includes a hydroxy group or a group in which a hydrogen atom of a hydroxy group is substituted with an acid crosslinking reactive group or an acid dissociation reactive group, the tellurium-containing compound being represented by the following formula (A-2) and the tellurium-containing resin being a resin comprising a constitutional unit represented by at least one of the following formulae (C1) and (C2):

OG Complex Work Unit Chemistry
wherein X is a 2m-valent group of 0 to 60 carbon atoms containing tellurium; Z is an oxygen atom, a sulfur atom, a single bond, or is not present; each R0A is independently selected from the group consisting of a hydrocarbon group, a halogen atom, a cyano group, a nitro group, an amino group, an alkyl group of 1 to 30 carbon atoms, an alkenyl group of 2 to 30 carbon atoms, an aryl group of 6 to 40 carbon atoms, a hydroxy group or a group in which a hydrogen atom of a hydroxy group is substituted with an acid crosslinking reactive group or an acid dissociation reactive group, and a combination thereof, wherein the alkyl group, the alkenyl group, and the aryl group each optionally have an ether bond, a ketone bond, or an ester bond, wherein at least one R0A is a hydroxy or a group in which a hydrogen atom of a hydroxy group is substituted with an acid crosslinking reactive group or an acid dissociation reactive group; m is an integer of 1 to 4; each p is independently an integer of 0 to 2; and each n is independently an integer of 0 to (5+2×p),

OG Complex Work Unit Chemistry

OG Complex Work Unit Chemistry
wherein each X4 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, a hydrogen atom, or a halogen atom; each R6 is independently a monovalent group containing an oxygen atom, a monovalent group containing a sulfur atom, a monovalent group containing a nitrogen atom, a hydrocarbon group, or a halogen atom; r is an integer of 0 to 2; and n6 is an integer of 2 to (4+2×r);
a solvent; and
an acid generating agent, the acid generating agent being a compound other than the tellurium-containing compound or the tellurium-containing resin, the acid generating agent generates an acid directly or indirectly by irradiation of any radiation selected from visible light, ultraviolet, excimer laser, electron beam, extreme ultraviolet (EUV), X-ray, and ion beam.