US 11,851,760 B2
PECVD deposition system for deposition on selective side of the substrate
Fayaz Shaikh, Lake Oswego, OR (US); Nick Linebarger, Beaverton, OR (US); and Curtis Bailey, West Linn, OR (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Dec. 16, 2021, as Appl. No. 17/644,760.
Application 17/644,760 is a continuation of application No. 17/080,749, filed on Oct. 26, 2020.
Application 17/080,749 is a continuation of application No. 15/692,300, filed on Aug. 31, 2017, granted, now 10,851,457, issued on Dec. 1, 2020.
Prior Publication US 2022/0162754 A1, May 26, 2022
Int. Cl. H01L 21/687 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); C23C 16/505 (2006.01); C23C 16/52 (2006.01); H01L 21/67 (2006.01); C23C 16/04 (2006.01)
CPC C23C 16/45574 (2013.01) [C23C 16/04 (2013.01); C23C 16/45519 (2013.01); C23C 16/45565 (2013.01); C23C 16/45597 (2013.01); C23C 16/505 (2013.01); C23C 16/52 (2013.01); H01L 21/0217 (2013.01); H01L 21/0262 (2013.01); H01L 21/02164 (2013.01); H01L 21/02211 (2013.01); H01L 21/02216 (2013.01); H01L 21/02274 (2013.01); H01L 21/67017 (2013.01); H01L 21/68735 (2013.01); H01L 21/68771 (2013.01); H01L 21/68785 (2013.01); H01L 21/02532 (2013.01); H01L 21/02595 (2013.01); H01L 21/67161 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A shower-pedestal for supplying processing gases to an underside of a wafer during semiconductor processing operations, the shower-pedestal comprising:
a top surface;
an enclosed plenum region located within the shower-pedestal;
a plurality of orifices arranged on the top surface and connected to the enclosed plenum region; and
a plurality of spacers, the spacers extending away from the top surface and configured to support a carrier ring thereover, wherein each spacer has a spacer top surface having a corresponding recessed region, each recessed region configured to receive a corresponding support extension projecting from the carrier ring that the spacers are configured to receive.