CPC C23C 16/45565 (2013.01) [C23C 16/4583 (2013.01); C23C 16/45536 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32458 (2013.01); H01J 2237/3321 (2013.01)] | 16 Claims |
1. A faceplate for a process chamber, the faceplate comprising:
a circular mounting ring configured to mount the faceplate within the process chamber;
a first surface;
a second surface opposite the first surface, the second surface configured to be exposed to a processing volume of the process chamber, the second surface including a first curved region having a first peak centered at and symmetric with respect to a vertical centerline of the faceplate; and
a plurality of apertures comprising first and second apertures extending through the faceplate from the first surface to the first curved region of the second surface,
wherein the first curved region has an increasing slope converging at the first peak, and the second apertures are radially outward of the first apertures with respect to the vertical centerline of the faceplate.
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