US 11,851,745 B2
Substrate processing method, substrate processing apparatus and pre-drying processing liquid
Yuta Sasaki, Kyoto (JP); Masayuki Otsuji, Kyoto (JP); Naozumi Fujiwara, Kyoto (JP); Masahiko Kato, Kyoto (JP); Yu Yamaguchi, Kyoto (JP); and Hiroaki Takahashi, Kyoto (JP)
Assigned to SCREEN Holdings Co., Ltd.
Filed by SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed on Jun. 30, 2021, as Appl. No. 17/363,161.
Application 17/363,161 is a continuation of application No. 16/445,451, filed on Jun. 19, 2019, granted, now 11,124,869.
Claims priority of application No. 2018-119092 (JP), filed on Jun. 22, 2018; and application No. 2019-050214 (JP), filed on Mar. 18, 2019.
Prior Publication US 2021/0324509 A1, Oct. 21, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 14/24 (2006.01); C23C 14/12 (2006.01)
CPC C23C 14/24 (2013.01) [C23C 14/12 (2013.01)] 1 Claim
OG exemplary drawing
 
1. A substrate processing method comprising:
a pre-drying processing liquid supplying step of supplying a front surface of a substrate, on which a pattern has been formed, with a pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves;
a film thickness reducing step of reducing a film thickness of the pre-drying processing liquid on the substrate while maintaining a state in which an entire front surface of the substrate is covered with a liquid film of the pre-drying processing liquid by rotating the substrate at a film thickness reducing speed to remove some of the pre-drying processing liquid on the front surface of the substrate until the film thickness is stabilized at a value corresponding to the film thickness reducing speed;
a solidified body forming step of forming a solidified body containing the sublimable substance on the front surface of the substrate by evaporating the solvent from the pre-drying processing liquid on the front surface of the substrate and gradually increasing a concentration of the sublimable substance in the pre-drying processing liquid and gradually reducing the film thickness of the pre-drying processing liquid; and
a sublimating step of removing the solidified body from the front surface of the substrate by sublimating the solidified body, wherein
the concentration of the sublimable substance in the pre-drying processing liquid that has not yet been supplied to the substrate is adjusted such that a value acquired by multiplying a ratio of a thickness of the solidified body when the solidified body is formed to a height of the pattern by 100 is 102 or greater and 138 or less, while controlling that a mass percent concentration of the sublimable substance in the pre-drying processing liquid is 0.89 or greater and 1.24 or less and a thickness of the solidified body is 100 nm or greater and 200 nm or less.