US 11,851,733 B2
Manufacturing method of porous silicon material, porous silicon material, and power storage device
Hiroyuki Kawaura, Nagakute (JP); Yasuhito Kondo, Nagakute (JP); Ryo Suzuki, Nagakute (JP); Hiroshi Nozaki, Nagakute (JP); Jun Yoshida, Mishima (JP); Tetsuya Waseda, Susono (JP); and Mitsutoshi Otaki, Susono (JP)
Assigned to TOYOTA JIDOSHA KABUSHIKI KAISHA, Toyota (JP)
Filed by TOYOTA JIDOSHA KABUSHIKI KAISHA, Toyota (JP)
Filed on Jun. 20, 2022, as Appl. No. 17/844,175.
Claims priority of application No. 2021-102903 (JP), filed on Jun. 22, 2021.
Prior Publication US 2022/0411897 A1, Dec. 29, 2022
Int. Cl. C22C 1/08 (2006.01); H01M 10/0525 (2010.01); C22C 1/10 (2023.01); C22C 29/18 (2006.01)
CPC C22C 1/08 (2013.01) [C22C 1/1094 (2013.01); C22C 29/18 (2013.01); H01M 10/0525 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A manufacturing method of a porous silicon material, comprising:
a particle forming step of making a silicon alloy that contains Al as a first element in an amount of 50% by mass or more and Si in an amount of 50% by mass or less into particles;
a pore forming step of removing the first element from the silicon alloy to obtain a porous material; and
a heat treatment step of heating the porous material to diffuse elements other than Si to a surface of the porous material.