US 11,851,570 B2
Anionic polishing pads formed by printing processes
Uma Sridhar, Sunnyvale, CA (US); Sivapackia Ganapathiappan, Los Altos, CA (US); Ashwin Chockalingam, Santa Clara, CA (US); Yingdong Luo, San Jose, CA (US); Daniel Redfield, Morgan Hill, CA (US); Rajeev Bajaj, Fremont, CA (US); Nag B. Patibandla, Pleasanton, CA (US); Hou T. Ng, Campbell, CA (US); and Sudhakar Madhusoodhanan, Pleasanton, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 30, 2019, as Appl. No. 16/668,961.
Claims priority of provisional application 62/832,881, filed on Apr. 12, 2019.
Prior Publication US 2020/0325353 A1, Oct. 15, 2020
Int. Cl. B29C 64/112 (2017.01); C09D 11/38 (2014.01); B24B 37/24 (2012.01); C09D 11/107 (2014.01); C09D 11/101 (2014.01); B33Y 80/00 (2015.01); B33Y 70/00 (2020.01); B29L 31/00 (2006.01); B29K 33/00 (2006.01); B33Y 10/00 (2015.01)
CPC C09D 11/38 (2013.01) [B24B 37/245 (2013.01); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12); C09D 11/101 (2013.01); C09D 11/107 (2013.01); B29C 64/112 (2017.08); B29K 2033/08 (2013.01); B29L 2031/736 (2013.01); B33Y 10/00 (2014.12)] 20 Claims
OG exemplary drawing
 
1. A method of forming a polishing pad, comprising:
depositing a plurality of composite layers with a 3D printer to reach a target thickness, wherein depositing the plurality of composite layers comprises:
dispensing one or more droplets of a curable resin precursor composition onto a support, wherein the curable resin precursor composition comprises:
one or more acrylate components; and
an anionic monomer having structure:

OG Complex Work Unit Chemistry
wherein at least one of R1, R2, and R3 is an alkyl ester radical, and the anionic monomer is present in an amount ranging between 2 wt. % to about 10 wt. % based on a total weight of the curable resin precursor composition;
dispensing one or more droplets of a porosity-forming composition onto the support, wherein at least one component of the porosity-forming composition is removable to form pores in the polishing pad; and
curing the curable resin precursor composition to form structural material containing regions comprising the anionic monomer, the structural material containing regions surrounding pore forming regions formed from the porosity-forming composition, wherein at least one exposed surface of the structural material containing region has a zeta potential of −50 mV or less.