US 12,496,626 B2
Substrate treating apparatus
Young Seo An, Gyeonggi-do (KR); Jae Hoon Park, Gyeonggi-do (KR); Young Ju Jo, Gyeonggi-do (KR); Kyung Jin Seo, Chungcheongnam-do (KR); Seo Jung Park, Gyeonggi-do (KR); Dae Myeong Lee, Busan (KR); Jae Hyun Lim, Chungcheongnam-do (KR); and Nam Kyu Kim, Chungcheongnam-do (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Mar. 24, 2023, as Appl. No. 18/125,738.
Claims priority of application No. 10-2022-0189587 (KR), filed on Dec. 29, 2022.
Prior Publication US 2024/0216965 A1, Jul. 4, 2024
Int. Cl. B08B 9/093 (2006.01); B08B 3/02 (2006.01); G03F 7/16 (2006.01)
CPC B08B 9/093 (2013.01) [B08B 3/022 (2013.01); G03F 7/168 (2013.01); B08B 2203/027 (2013.01); B08B 2209/08 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a spin chuck supporting a substrate;
a rinse liquid supply unit supplying a rinse liquid;
a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and
a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.