US 11,842,866 B2
Pressure monitoring device and pressure monitoring method for vacuum valve
Kazuhiro Satou, Tokyo (JP); Takashi Sato, Tokyo (JP); Shindai Satou, Tokyo (JP); and Masanori Shishido, Tokyo (JP)
Assigned to HITACHI INDUSTRIAL EQUIPMENT SYSTEMS CO., LTD., Tokyo (JP)
Appl. No. 17/420,208
Filed by Hitachi Industrial Equipment Systems Co., Ltd., Tokyo (JP)
PCT Filed Apr. 22, 2019, PCT No. PCT/JP2019/016923
§ 371(c)(1), (2) Date Jul. 1, 2021,
PCT Pub. No. WO2020/179089, PCT Pub. Date Sep. 10, 2020.
Claims priority of application No. 2019-038254 (JP), filed on Mar. 4, 2019.
Prior Publication US 2022/0068579 A1, Mar. 3, 2022
Int. Cl. H01H 33/668 (2006.01); G01R 31/327 (2006.01)
CPC H01H 33/668 (2013.01) [G01R 31/327 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A vacuum valve pressure monitoring device which is disposed in a vacuum breaker including: a main circuit opening/closing part including a vacuum valve and an
insulating frame covering the vacuum valve; and an operation mechanism part for opening/closing a contact of the vacuum valve, the pressure monitoring device comprising:
a first electrode disposed on one side surface of the insulating frame and grounded via an impedance;
a second electrode disposed on another side surface of the insulating frame and grounded via a switch; and
a potential measuring device connected in between the impedance and the first electrode.