CPC G03F 7/70091 (2013.01) [G02B 19/0033 (2013.01); G02B 27/0927 (2013.01); G02B 27/0955 (2013.01)] | 20 Claims |
1. An exposure apparatus configured to expose a substrate, the exposure apparatus comprising:
an illumination optical system including:
a first solid-state light emitting element;
a second solid-state light emitting element;
a first collimate lens through which light from the first solid-state light emitting element passes, the first collimate lens having an optical axis;
a second collimate lens through which light from the second solid-state light emitting element passes, the second collimate lens having an optical axis; and
a condenser lens configured to condense light having passed through the first and second collimate lenses, the illumination optical system being configured to illuminate a mask with light from the first and second solid-state light emitting elements; and
a projection optical system configured to project an image of a pattern of the mask onto the substrate,
wherein the first solid-state light emitting element is oriented about the optical axis of the first collimate lens at a first angle of rotation,
wherein the second solid-state light emitting element is oriented about the optical axis of the second collimate lens at a second angle of rotation,
wherein the first angle of rotation is different from the second angle of rotation,
wherein the first solid-state light emitting element emits light such that a maximum intensity is achieved outside the optical axis of the first collimate lens and the second solid-state light emitting element emits light such that maximum intensity is achieved outside the optical axis of the second collimate lens,
wherein a pupil plane intensity distribution near a rear focal position of the condenser lens is a light intensity distribution formed by superimposing light from the first solid-state light emitting elements and second solid-state light emitting elements, so that the optical axis of the first collimate lens and the optical axis of the second collimate lens coincide with an optical axis of the condenser lens, and
wherein the pupil plane intensity distribution is a light intensity distribution having a maximum intensity outside an optical axis of the illumination optical system.
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