US 11,841,288 B2
Optical measurement method and system and optical device manufacturing system
Shunyi Tan, Shanghai (CN)
Assigned to SHANGHAI INTELIGHT ELECTRONIC TECHNOLOGY CO., LTD., Shanghai (CN); and JIANGSU INTELIGHT ELECTRONIC TECHNOLOGY CO., LTD., Suzhou (CN)
Appl. No. 17/298,662
Filed by SHANGHAI INTELIGHT ELECTRONIC TECHNOLOGY CO., LTD., Shanghai (CN); and JIANGSU INTELIGHT ELECTRONIC TECHNOLOGY CO., LTD., Suzhou (CN)
PCT Filed Mar. 21, 2019, PCT No. PCT/CN2019/079069
§ 371(c)(1), (2) Date May 31, 2021,
PCT Pub. No. WO2020/113855, PCT Pub. Date Jun. 11, 2020.
Claims priority of application No. 201811468152.9 (CN), filed on Dec. 3, 2018.
Prior Publication US 2022/0034751 A1, Feb. 3, 2022
Int. Cl. G01M 11/02 (2006.01)
CPC G01M 11/0257 (2013.01) [G01M 11/0207 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An optical measurement system, comprising:
an image generation system configured for generating test image information, adding wavefront compensation into the test image information and outputting light containing the test image information to a device under test, wherein an assembled spatial position of an optical device in the device under test is measured and adjusted by simulating the wavefront, or the wavefront compensation is configured for compensating a missing optical part in the device under test;
an image measurement system configured for obtaining detected image information according to the light passing through the device under test; and
a control system configured for calculating and/or selecting the test image information and outputting the test image information to the image generation system.