CPC B05B 13/0442 (2013.01) [B05B 13/0278 (2013.01); B05C 5/02 (2013.01); B05C 11/00 (2013.01); H01L 21/6715 (2013.01)] | 6 Claims |
1. A substrate processing apparatus for processing a substrate using a processing liquid, the substrate processing apparatus comprising:
a holder that holds the substrate horizontally;
a rotator that rotates the holder holding the substrate;
a nozzle that supplies the processing liquid to the substrate;
a nozzle arm that holds the nozzle;
an arm actuator that moves the nozzle arm between a processing position overlapping the substrate in plan view and a retracted position displaced from the substrate in plan view;
a cup portion that is disposed around the holder, and receives the processing liquid from the substrate;
a cup actuator that moves the cup portion up and down between an upper position and a lower position;
a first container that is fixed to the cup portion to be movable up and down integrally with the cup portion, and is capable of accommodating the nozzle at the retracted position; and
a controller that is configured to have a first control mode in which the cup actuator is controlled to move the cup portion from the lower position to the upper position when the nozzle is at the retracted position,
wherein the upper position is set so that an upper surface of the first container is above a tip of the nozzle when the cup portion is moved to the upper position in the first control mode.
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