US 12,494,342 B2
Systems and methods for charged particle flooding to enhance voltage contrast defect signal
Frank Nan Zhang, San Jose, CA (US); Zhongwei Chen, San Jose, CA (US); Yixiang Wang, Fremont, CA (US); and Ying Crystal Shen, Fremont, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Feb. 2, 2024, as Appl. No. 18/431,759.
Application 18/431,759 is a continuation of application No. 17/026,044, filed on Sep. 18, 2020, granted, now 11,929,232.
Application 17/026,044 is a continuation of application No. 16/053,636, filed on Aug. 2, 2018, granted, now 10,784,077, issued on Sep. 22, 2020.
Claims priority of provisional application 62/550,613, filed on Aug. 26, 2017.
Claims priority of provisional application 62/540,548, filed on Aug. 2, 2017.
Prior Publication US 2024/0379325 A1, Nov. 14, 2024
Int. Cl. H01J 37/26 (2006.01); H01J 37/04 (2006.01); H01J 37/28 (2006.01)
CPC H01J 37/265 (2013.01) [H01J 37/045 (2013.01); H01J 37/266 (2013.01); H01J 37/28 (2013.01); H01J 2237/0044 (2013.01); H01J 2237/0048 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/0455 (2013.01); H01J 2237/0458 (2013.01); H01J 2237/049 (2013.01); H01J 2237/28 (2013.01); H01J 2237/2817 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A charged particle beam system comprising:
a charged particle source configured to emit a charged particle beam;
a controller configured to cause the charged particle beam system (i) to perform a plurality of operation modes, including a flooding mode and an inspection mode, and (ii) to control a beam current level and a beam spot size of the charged particle beam;
a plurality of electromagnetic lenses configured to manipulate the charged particle beam depending on an operation mode that the charged particle beam system is operating, wherein:
a first set of one or more of the plurality of electromagnetic lenses are configured to adjust the beam current level to a first beam current level during the flooding mode and to a second beam current level during the inspection mode, and
a second set of one or more of the plurality of electromagnetic lenses are configured to adjust the beam spot size to a first beam spot size during the flooding mode and to a second beam spot size during the inspection mode; and
a condenser lens configured to manipulate the charged particle beam, wherein the condenser lens is located between the charged particle source and the plurality of electromagnetic lenses.