US 12,492,890 B2
In-situ reflectometry for real-time process control
Khokan C. Paul, Cupertino, CA (US); Zhepeng Cong, San Jose, CA (US); Tao Sheng, Santa Clara, CA (US); Edward W. Budiarto, Fremont, CA (US); and Todd Egan, Fremont, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 28, 2023, as Appl. No. 18/308,844.
Claims priority of provisional application 63/419,996, filed on Oct. 27, 2022.
Prior Publication US 2024/0142223 A1, May 2, 2024
Int. Cl. G01B 11/06 (2006.01)
CPC G01B 11/0625 (2013.01) 19 Claims
OG exemplary drawing
 
1. A method of calibrating support rotation, comprising:
rotating a substrate support disposed in a processing chamber;
directing light into a process volume of the processing chamber through an upper window;
collecting reflected light while a first substrate is supported on the substrate support;
determining spectrum data from the reflected light;
associating the spectrum data with one or more angular positions of the substrate support;
determining a corrective factor of the substrate support for at least one of the one or more angular positions based on the spectrum data;
replacing the first substrate with a second substrate;
performing a processing operation on the second substrate while measuring a parameter of the second substrate to form one or more measurements corresponding to the one or more angular positions; and
applying the corrective factor to the one or more measurements.