US 12,157,029 B2
Process apparatus and process method
Kenya Uchida, Yokohama (JP); Hiroyuki Fukui, Yokkaichi (JP); Ikuo Uematsu, Yokohama (JP); Takeaki Iwamoto, Sendai (JP); and Eunsang Kwon, Sendai (JP)
Assigned to KABUSHIKI KAISHA TOSHIBA, Tokyo (JP); Kioxia Corporation, Tokyo (JP); and TOHOKU UNIVERSITY, Sendai (JP)
Filed by KABUSHIKI KAISHA TOSHIBA, Tokyo (JP); Kioxia Corporation, Tokyo (JP); and TOHOKU UNIVERSITY, Sendai (JP)
Filed on Jul. 9, 2021, as Appl. No. 17/305,535.
Application 17/305,535 is a continuation of application No. PCT/JP2020/002022, filed on Jan. 22, 2020.
Claims priority of application No. 2019-011519 (JP), filed on Jan. 25, 2019.
Prior Publication US 2021/0331018 A1, Oct. 28, 2021
Int. Cl. A62D 3/36 (2007.01); A62D 101/49 (2007.01); C23C 16/44 (2006.01)
CPC A62D 3/36 (2013.01) [C23C 16/4412 (2013.01); A62D 2101/49 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A process apparatus that performs processing on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element, the apparatus comprising:
a process liquid tank that stores process liquid including a basic aqueous solution;
a processing tank into which a process target member including the byproduct is introduced;
a supplier that supplies the process liquid from the process liquid tank to the processing tank and performs processing on the byproduct in the processing tank with the supplied process liquid;
an exhauster that exhausts a gas generated by reaction between the process liquid and the byproduct from the processing tank; and
a jig that maintains the process target member in a predetermined posture in the process liquid in the processing tank, and in a state where an opening of a pipe of the process target member faces a side where a liquid surface of the process liquid is located.
 
5. A process method performed on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element, the method comprising:
introducing a process target member including the byproduct into a processing tank;
storing process liquid including a basic aqueous solution in the processing tank;
maintaining the process target member in a predetermined posture in the process liquid in the processing tank, and in a state where an opening of a pipe of the process target member faces a side where a liquid surface of the process liquid is located;
performing processing on the byproduct in the processing tank with the stored process liquid; and
exhausting a gas generated by reaction between the process liquid and the byproduct from the processing tank.