US 11,839,033 B2
Method of directly patterning stretchable substrate and stretchable electrode fabricated by the same
Soong Ju Oh, Seoul (KR); and Jun Sung Bang, Goyang-si (KR)
Assigned to KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, Seoul (KR)
Filed by Korea University Research and Business Foundation, Seoul (KR)
Filed on Apr. 25, 2022, as Appl. No. 17/728,234.
Claims priority of application No. 10-2021-0068786 (KR), filed on May 28, 2021.
Prior Publication US 2022/0386477 A1, Dec. 1, 2022
Int. Cl. H05K 1/00 (2006.01); H05K 1/02 (2006.01); H05K 3/06 (2006.01); H03K 19/21 (2006.01); A61K 8/06 (2006.01); A61K 8/26 (2006.01); A61K 8/89 (2006.01); A61K 8/92 (2006.01); A61K 8/891 (2006.01); A61K 8/895 (2006.01); A61Q 1/04 (2006.01); A61Q 1/06 (2006.01); H05K 3/38 (2006.01); H05K 1/09 (2006.01)
CPC H05K 3/389 (2013.01) [H05K 1/0283 (2013.01); H05K 3/064 (2013.01); H05K 3/381 (2013.01); H05K 1/092 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A method of directly patterning a stretchable substrate, the method comprising:
forming a hydrophilic group on a surface of a stretchable substrate by UV-ozone treatment;
forming at least one layer to be etched on the hydrophilic group-formed stretchable substrate, wherein the at least one layer to be etched comprises an adhesion enhancing material;
forming a photoresist layer on the at least one layer to be etched;
exposing the photoresist layer; and
patterning the at least one layer to be etched using the exposed photoresist layer,
wherein a carbon chain comprised in the adhesion enhancing material forms ether bonding (R—O—R) with a hydrophilic group formed on the surface of the stretchable substrate.