US 11,835,850 B2
Reticle in an apparatus for extreme ultraviolet exposure
Sanghyun Kim, Hwaseong-si (KR); and Jinho Jeon, Seoul (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Feb. 11, 2021, as Appl. No. 17/173,245.
Claims priority of application No. 10-2020-0074084 (KR), filed on Jun. 18, 2020.
Prior Publication US 2021/0397076 A1, Dec. 23, 2021
Int. Cl. G03F 1/24 (2012.01); G03F 1/58 (2012.01); G03F 1/60 (2012.01); H01L 21/033 (2006.01)
CPC G03F 1/24 (2013.01) [G03F 1/58 (2013.01); G03F 1/60 (2013.01); H01L 21/0332 (2013.01); H01L 21/0337 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A reticle in an apparatus for extreme ultraviolet (EUV) exposure, the reticle comprising:
a substrate including an image area and a black border area surrounding the image area;
a multi-layer structure on the image area and the black border area of the substrate, the multi-layer structure to reflect EUV light;
a capping layer covering the multi-layer structure;
first absorber layer patterns on the capping layer in the image area and the black border area; and
an absorber structure on the capping layer in the black border area, the absorber structure including one of the first absorber layer patterns, a hard mask pattern, and a second absorber layer pattern sequentially stacked, the absorber structure covering an entire upper surface of the capping layer in the black border area.