CPC G02F 1/3503 (2021.01) [G02B 27/281 (2013.01); G02F 1/353 (2013.01); G02F 1/354 (2021.01); G02F 1/3555 (2013.01); G02F 1/365 (2013.01); G02F 2201/02 (2013.01); G02F 2201/58 (2013.01); G02F 2203/07 (2013.01); G02F 2203/48 (2013.01)] | 17 Claims |
1. An apparatus for high harmonic generation (HHG) comprising:
a polarized ultrashort pulse laser source;
an HHG assembly comprising a gas distribution block and a waveguide cartridge having a HHG hollow core waveguide, the waveguide cartridge removeably attached to the gas distribution block, and the gas distribution block configured to maintain a pressure profile within the HHG hollow core waveguide;
two operating beam sensors;
two actuatable mirrors, and a processor configured to communicate with the operating beam sensors and automatically and repeatedly adjust the actuatable mirrors while the apparatus is operating such that a beam from the ultrashort pulse laser source is directed into the HHG hollow core waveguide;
wherein the HHG assembly is fixed in place with respect to the two operating beam sensors during operation.
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