US 12,489,104 B2
Processes for forming metal oxide thin films on electrode interphase control
Christian Dussarrat, Tokyo (JP); Sanghoon Kim, Yokohama (JP); and Sunao Kamimura, Yokosuka (JP)
Assigned to L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, Paris (FR)
Appl. No. 18/714,740
Filed by L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude, Paris (FR)
PCT Filed Dec. 1, 2022, PCT No. PCT/US2022/051515
§ 371(c)(1), (2) Date May 30, 2024,
PCT Pub. No. WO2023/102107, PCT Pub. Date Jun. 8, 2023.
Claims priority of provisional application 63/284,961, filed on Dec. 1, 2021.
Prior Publication US 2024/0396001 A1, Nov. 28, 2024
Int. Cl. H01M 4/04 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01M 4/02 (2006.01)
CPC H01M 4/0428 (2013.01) [C23C 16/405 (2013.01); C23C 16/45553 (2013.01); H01M 2004/028 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method of coating a cathode or a cathode active material with a metal oxide film, the method comprising the steps of:
a1. exposing the cathode or cathode active material to a chemical precursor vapor comprising a precursor of the formula M(═NRa)(ORb)2(NR22) and an oxygen source as an oxidizing co-reactant, and
b1. depositing the metal oxide film on the cathode or cathode active material,
wherein:
M is selected from Nb, Ta, or V,
Ra is selected from iPr, tBu, t-Am
Rb each is independently selected from Et, iPr, tBu, sBu or SPen, and
Rc each is independently selected from Et or Me.