| CPC H01J 37/32724 (2013.01) [H01L 21/67248 (2013.01); H01L 21/6833 (2013.01); H01L 21/68735 (2013.01); H01L 21/68757 (2013.01); H01J 2237/3341 (2013.01)] | 12 Claims |

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6. A substrate support assembly, comprising:
an electrostatic chuck having a chuck body made from ceramic, the chuck body having an embedded high voltage chucking electrode; the chuck body having a workpiece support surface and a bonding chuck body surface, the workpiece support surface and the bonding chuck body surface having a flatness of less than about 10 microns;
a plurality of heaters arranged in at least 4 separate zones and disposed in contact with the bonding chuck body surface outside the chuck body:
a first heater of the plurality of heaters disposed in contact with the bonding chuck body surface outside the chuck body, a first portion of the first heater having a trimmed smaller sectional area and a higher resistance relative to an adjacent second portion portions of the first heater to provide a desired temperature output, wherein the first portion and the second portion are arranged in series along a single electrically continuous path;
a cooling base;
an insulating layer disposed over the first heater and the bonding chuck body surface and in contact with the cooling base, wherein the insulating layer electrically insulates the first heater from the cooling base, wherein the insulating layer is a bonding layer; and
a ceramic shaft having leads connected to the heater and to the chucking electrode embedded in the electrostatic chuck.
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