US 12,488,957 B2
Crenellated sample holder and sputter target for sample preparation in cryo electron microscopy applications
Chad Rue, Hillsboro, OR (US)
Assigned to FEI Company, Hillsboro, OR (US)
Filed by FEI Company, Hillsboro, OR (US)
Filed on Mar. 30, 2023, as Appl. No. 18/193,545.
Prior Publication US 2024/0331969 A1, Oct. 3, 2024
Int. Cl. H01J 37/20 (2006.01); C23C 14/14 (2006.01); C23C 14/34 (2006.01); H01J 37/28 (2006.01); H01J 37/305 (2006.01)
CPC H01J 37/20 (2013.01) [C23C 14/14 (2013.01); C23C 14/3407 (2013.01); H01J 37/28 (2013.01); H01J 37/305 (2013.01); H01J 2237/081 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/31749 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A sputtering target for a sample situated for charged particle beam milling in a charged-particle beam (CPB) instrument, comprising:
a conductive material defining an internal cavity adapted to receive the sample at a sample surface, the conductive material defining at least one window that provides a glancing angle CPB processing path to the sample surface as situated in the CPB instrument; and
a first sputterable material situated opposite the at least one window to define a CPB sputtering path through the at least one window to the first sputterable material.