US 12,487,532 B2
EUV collector inspection apparatus and inspection method
Jongbin Park, Gangneung-si (KR); Jeonggil Kim, Hwaseong-si (KR); Matsuda Yozo, Suwon-si (KR); Donghyub Lee, Hwaseong-si (KR); Dohyun Jung, Suwon-si (KR); Yoojin Jeong, Suwon-si (KR); Eunhee Jeang, Hwaseong-si (KR); Wondon Joo, Seoul (KR); and Minseok Choi, Hwaseong-si (KR)
Assigned to Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Jun. 23, 2022, as Appl. No. 17/847,477.
Claims priority of application No. 10-2021-0131163 (KR), filed on Oct. 1, 2021.
Prior Publication US 2023/0108698 A1, Apr. 6, 2023
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70591 (2013.01) [G03F 7/70033 (2013.01); G03F 7/7085 (2013.01); G03F 7/70908 (2013.01)] 19 Claims
OG exemplary drawing
 
16. An extreme ultraviolet (EUV) collector inspection apparatus comprising:
a stage configured to support an EUV collector to be inspected;
a light blocking cover configured to cover a front surface of the EUV collector and to provide a space portion in which external light is blocked;
a light source in the space portion, the light source having a pillar shape extending along a central axis of the EUV collector, the light source configured to output irradiated light ranging from an ultraviolet (UV) band to a visible light (VIS) band; and
a spectrometer above the light source and configured to detect a spectrum of reflected light from the irradiated light reflected from the front surface of the EUV collector,
wherein the apparatus or a controller associated therewith is configured to inspect a contamination state of the front surface of the EUV collector based on the spectrum of reflected light.