	US 12,487,524 B2
	Resist material and patterning process
Jun Hatakeyama, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed on Jun. 7, 2022, as Appl. No. 17/834,319.
Claims priority of application No. 2021-102932 (JP), filed on Jun. 22, 2021.
Prior Publication US 2023/0022129 A1, Jan. 26, 2023
Int. Cl. G03F 7/004 (2006.01); C07C 381/12 (2006.01); C07D 207/448 (2006.01); G03F 7/06 (2006.01)

CPC G03F 7/0045 (2013.01) [C07C 381/12 (2013.01); C07D 207/448 (2013.01); G03F 7/004 (2013.01); G03F 7/066 (2013.01)]

20 Claims

1. A resist material comprising a quencher, wherein the quencher contains a sulfonium salt of a carboxylic acid bonded to a maleimide group.