US 12,486,573 B2
Thin-film forming raw material, thin-film and method of producing thin-film
Masako Hatase, Tokyo (JP); Chiaki Mitsui, Tokyo (JP); and Atsushi Yamashita, Tokyo (JP)
Assigned to ADEKA CORPORATION, Tokyo (JP)
Appl. No. 18/571,903
Filed by ADEKA CORPORATION, Tokyo (JP)
PCT Filed Jun. 17, 2022, PCT No. PCT/JP2022/024289
§ 371(c)(1), (2) Date Dec. 19, 2023,
PCT Pub. No. WO2023/276716, PCT Pub. Date Jan. 5, 2023.
Claims priority of application No. 2021-110128 (JP), filed on Jul. 1, 2021.
Prior Publication US 2024/0301553 A1, Sep. 12, 2024
Int. Cl. B32B 3/10 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01)
CPC C23C 16/45553 (2013.01) [C23C 16/18 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A thin-film forming raw material, comprising an

OG Complex Work Unit Chemistry
alkoxide compound represented by the following general formula (1):
where
R1 is a sec-butyl group,
R2 is a sec-butyl group,
R3 is a sec-butyl group,
R4 is a sec-butyl group,
M represents a rare earth metal atom, and
“n” represents a valence of the rare earth metal atom.