US 12,486,571 B2
Atomic layer deposition coating system for inner walls of gas lines
Hanish Kumar Panavalappil Kumarankutty, Bangalore (IN); Yogesh Tomar, Bangalore (IN); Nikshep M. Patil, Bangalore (IN); Hari Venkatesh Rajendran, Bangalore (IN); Kirubanandan Naina Shanmugam, Bangalore (IN); Gayatri Natu, Mumbai (IN); Mahesh Arcot, Mumbai (IN); Senthil Kumar Nattamai Subramanian, Hosur (IN); Steven D. Marcus, San Jose, CA (US); and Michael R. Rice, Pleasanton, CA (US)
Assigned to APPLIED MATERIALS, INC., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 7, 2022, as Appl. No. 17/962,378.
Prior Publication US 2024/0117491 A1, Apr. 11, 2024
Int. Cl. C23C 16/455 (2006.01); C23C 16/44 (2006.01)
CPC C23C 16/45544 (2013.01) [C23C 16/4412 (2013.01); C23C 16/45557 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for coating a plurality of gas lines via an ALD process, comprising:
an oven having an enclosure that defines an interior volume configured to house the plurality of gas lines, the enclosure having one or more doors configured for transferring the plurality of gas lines into and out of the interior volume;
a plurality of inlet ports disposed through a first wall of the enclosure, wherein each of the plurality of inlet ports are configured for coupling to a first end of a corresponding one of the plurality of gas lines;
a plurality of exhaust ports disposed through a second wall of the enclosure, wherein each of the plurality of exhaust ports are configured for coupling to a second end of a corresponding one of the plurality of gas lines;
a fluid panel disposed outside of the oven and coupled to the plurality of inlet ports via corresponding ones of a plurality of fluid distribution assemblies; and
a foreline disposed outside of the oven and coupled to the plurality of exhaust ports.