US 12,486,560 B2
Alignment mechanism, alignment method, film forming device and film forming method
Shunsuke Okabe, Tokyo (JP); Kentaro Suzuki, Tokyo (JP); Taiichirou Aoki, Tokyo (JP); and Yoshihiro Nakasu, Tokyo (JP)
Assigned to CANON TOKKI CORPORATION, Mitsuke (JP)
Filed by Canon Tokki Corporation, Mitsuke (JP)
Filed on Jan. 20, 2022, as Appl. No. 17/580,046.
Application 17/580,046 is a continuation of application No. PCT/JP2020/028386, filed on Jul. 22, 2020.
Claims priority of application No. 10-2019-0089113 (KR), filed on Jul. 23, 2019.
Prior Publication US 2022/0148931 A1, May 12, 2022
Int. Cl. H01L 21/66 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); H10K 71/00 (2023.01); H10K 71/16 (2023.01)
CPC C23C 14/042 (2013.01) [C23C 14/24 (2013.01); H01L 22/20 (2013.01); H10K 71/166 (2023.02); H10K 71/00 (2023.02)] 14 Claims
OG exemplary drawing
 
1. An alignment method for adjusting positions of a substrate and a mask, the alignment method comprising:
supporting the substrate by a temporary receiver configured to (i) temporarily support the substrate before the substrate is suctioned by a substrate suctioner configured to suction and hold the substrate and to (ii) temporarily support the mask before the mask is supported by a mask supporter configured to support the mask;
adjusting a position of the substrate, while the substrate is being supported by the temporary receiver, with respect to the substrate suctioner by driving a horizontal coarse movement stage mechanism configured to move both of (i) the mask supporter, which is configured to support the mask after the mask has been supported by the temporary receiver, and (ii) the temporary receiver, which is configured to temporarily support the substrate before the substrate is suctioned by a substrate suctioner and to temporarily support the mask before the mask is supported by the mask supporter, in a horizontal plane; and
suctioning the substrate, which has been positionally adjusted by driving a vertical coarse movement stage mechanism that raises and lowers the horizontal coarse movement stage mechanism, with the substrate suctioner.
 
13. An alignment method for adjusting positions of a substrate and a mask, the alignment method comprising:
supporting the mask by a temporary receiver configured to (i) temporarily support the substrate before the substrate is suctioned by a substrate suctioner configured to suction and hold the substrate and to (ii) temporarily support the mask before the mask is supported by a mask supporter configured to support the mask;
adjusting a position of the mask, while the mask is being supported by the temporary receiver, by driving a horizontal coarse movement stage mechanism configured to move both of (i) the mask supporter, which is configured to support the mask after the mask has been supported by the temporary receiver, and (ii) the temporary receiver, which is configured to temporarily support the substrate before the substrate is suctioned by a substrate suctioner and to temporarily support the mask before the mask is supported by the mask supporter, in a horizontal plane; and
placing the mask, which has been positionally adjusted by driving the horizontal coarse movement stage mechanism to move the mask supporter and the temporary receiver in the horizontal plane, on the mask supporter.