US 12,156,390 B2
Electromagnetic wave shielding film, and method for manufacturing same
Byungsung Kim, Seoul (KR); Seungnam Cha, Seoul (KR); Sangyeon Pak, Gyeonggi-do (KR); and Taehun Kim, Gyeonggi-do (KR)
Assigned to LG ELECTRONICS INC., Seoul (KR)
Appl. No. 18/245,299
Filed by LG ELECTRONICS INC., Seoul (KR); and RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, Gyeonggi-do (KR)
PCT Filed Aug. 25, 2021, PCT No. PCT/KR2021/011351
§ 371(c)(1), (2) Date Mar. 14, 2023,
PCT Pub. No. WO2022/059953, PCT Pub. Date Mar. 24, 2022.
Claims priority of application No. 10-2020-0120749 (KR), filed on Sep. 18, 2020.
Prior Publication US 2023/0363126 A1, Nov. 9, 2023
Int. Cl. H05K 9/00 (2006.01)
CPC H05K 9/0084 (2013.01) [H05K 9/0088 (2013.01)] 12 Claims
OG exemplary drawing
 
1. An electromagnetic wave shielding film comprising:
a base substrate; and
an electromagnetic wave shielding layer disposed on the base substrate,
wherein the shielding layer includes a base layer disposed on the base substrate and a surface layer disposed on the base layer,
wherein the base layer includes first crystal grains,
wherein the surface layer includes second crystal grains, and
wherein a size of the second crystal grain is different from a size of the first crystal grain.