CPC H01L 24/14 (2013.01) [H01L 21/6835 (2013.01); H01L 23/12 (2013.01); H01L 23/48 (2013.01); H01L 23/50 (2013.01); H01L 23/5381 (2013.01); H01L 23/5389 (2013.01); H01L 24/06 (2013.01); H01L 24/19 (2013.01); H01L 24/96 (2013.01); H01L 21/568 (2013.01); H01L 2224/02 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/04105 (2013.01); H01L 2224/12105 (2013.01); H01L 2224/16227 (2013.01); H01L 2224/16235 (2013.01); H01L 2224/20 (2013.01); H01L 2224/92 (2013.01); H01L 2924/01005 (2013.01); H01L 2924/01013 (2013.01); H01L 2924/01029 (2013.01); H01L 2924/01068 (2013.01); H01L 2924/014 (2013.01); H01L 2924/15174 (2013.01); H01L 2924/15311 (2013.01); H01L 2924/15312 (2013.01); H01L 2924/15313 (2013.01); H01L 2924/181 (2013.01); H01L 2924/19015 (2013.01); H01L 2924/19042 (2013.01); H01L 2924/19104 (2013.01)] | 20 Claims |
1. A semiconductor device, comprising:
a semiconductor chip having a face comprising a first contact element and a second contact element, the semiconductor chip having a backside opposite the face, and the semiconductor chip having a first sidewall and a second sidewall, the second sidewall opposite the first sidewall;
a mold mass in contact with the first sidewall and the second sidewall of the semiconductor chip, the mold mass having a top surface co-planar with the face of the semiconductor chip;
a first dielectric layer having a first side opposite a second side, the first side of the first dielectric layer on the face of the chip and on the mold mass;
a first contact and a second contact within the first dielectric layer, the first contact coupled to the first contact element of the semiconductor chip, and the second contact coupled to the second contact element of the semiconductor chip;
a metallization layer on the second side of the first dielectric layer, the metallization layer comprising a first conducting element, a second conducting element and a third conducting element, the first conducting element coupled to the first contact, the second conducting element coupled to the second contact, and the third conducting element between the first conducting element and the second conducting element; and
a second dielectric layer on the metallization layer.
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