US 12,154,753 B2
Device to control uniformity of extracted ion beam
Jay T. Scheuer, Rowley, MA (US); Graham Wright, Newburyport, MA (US); Peter F. Kurunczi, Cambridge, MA (US); and Alexandre Likhanskii, Middleton, MA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Sep. 13, 2021, as Appl. No. 17/473,101.
Prior Publication US 2023/0082224 A1, Mar. 16, 2023
Int. Cl. H01J 37/08 (2006.01); H01J 37/317 (2006.01)
CPC H01J 37/08 (2013.01) [H01J 37/3171 (2013.01); H01J 2237/06308 (2013.01); H01J 2237/0815 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An ion source, comprising:
a chamber comprising a first end, a second end and a plurality of walls connecting the first end and the second end, wherein one of the plurality of walls is an extraction plate having an extraction aperture having a width greater than its height; and
a plasma generator to generate a plasma within the chamber;
wherein one of the plurality of walls, different from the extraction plate, is a protruding wall, having a protrusion extending toward an interior of the chamber, such that the protrusion causes a thickness of the protruding wall to vary as a function of position in a width direction.