	US 12,153,347 B2
	Organically modified metal oxide nanoparticle, method for producing the same, EUV photoresist material, and method for producing etching mask
Kiwamu Sue, Tsukuba (JP); and Sho Kataoka, Tsukuba (JP)
Assigned to NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, (JP)
Appl. No. 17/256,027
Filed by NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, Tokyo (JP)
PCT Filed Jun. 19, 2019, PCT No. PCT/JP2019/024286 § 371(c)(1), (2) Date Dec. 24, 2020, PCT Pub. No. WO2020/004172, PCT Pub. Date Jan. 2, 2020.
Claims priority of application No. 2018-124526 (JP), filed on Jun. 29, 2018; and application No. 2019-021317 (JP), filed on Feb. 8, 2019.
Prior Publication US 2021/0149299 A1, May 20, 2021
Int. Cl. G03F 7/004 (2006.01); C07F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); H01L 21/027 (2006.01)

CPC G03F 7/0042 (2013.01) [C07F 7/003 (2013.01); H01L 21/0274 (2013.01); G03F 7/2004 (2013.01); G03F 7/325 (2013.01)]

13 Claims

1. Organically modified metal oxide nanoparticles including a plurality of organically modified metal oxide nanoparticles, each organically modified metal oxide nanoparticle comprising:

a core including a plurality of metal atoms and a plurality of oxygen atoms bonded to the plurality of metal atoms;

a first modification group which is a carboxylic acid carboxylate ligand coordinated to the core;

a second modification group which is a carboxylic acid carboxylate ligand coordinated to the core and having a smaller molecular weight than the first modification group and/or an inorganic anion smaller in size than the first modification group,

wherein each nanoparticle is represented by general formula M₆O₄(OH)₄X_nY_12−n,

provided that M is the metal atom and is one or more selected from the group consisting of Zr, Hf, and Ti, X is the first modification group, Y is the second modification group, and 1≤n≤11 is satisfied, and

X and Y of the general formula satisfies a relationship 5 mol %≤X/(X+Y)×100≤95 mol %.