| CPC G02B 27/0172 (2013.01) [G02B 5/1852 (2013.01); G02B 6/0011 (2013.01); G02B 6/29304 (2013.01); G02B 5/1819 (2013.01); G02B 2027/0178 (2013.01)] | 18 Claims |
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4. A method of fabricating a substrate, comprising:
providing a substrate having a planar surface comprising a coating;
providing a beam writing system operable to write in a first direction and a second direction, wherein said second direction is perpendicular to said first direction;
providing a diffraction pattern layout, comprising:
a first plurality of linear diffractive features, and
a second plurality of linear diffractive features,
locating said substrate in said beam writing system, wherein said beam writing system is operable to write into said coating;
aligning one of said first and second pluralities of linear diffractive features parallel with said beam writing system first direction; and
writing said diffraction pattern layout into said coating;
wherein at least one of said first and second pluralities of diffractive features comprise diffractive features having a stepped pattern operable to diffract incident light as if said stepped pattern diffractive features were linear diffractive features.
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