US 12,153,191 B2
Optical device and method of manufacturing the same
Youngchul Leem, Uiwang-si (KR); Jeongyub Lee, Yongin-si (KR); and Haesung Kim, Hwaseong-si (KR)
Assigned to Samsung Electronics Co., Ltd., Gyeonggi-Do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Apr. 21, 2022, as Appl. No. 17/726,064.
Claims priority of application No. 10-2021-0151669 (KR), filed on Nov. 5, 2021.
Prior Publication US 2023/0144948 A1, May 11, 2023
Int. Cl. G02B 1/00 (2006.01)
CPC G02B 1/005 (2013.01) 16 Claims
OG exemplary drawing
 
1. An optical device comprising:
a substrate; and
a nanopattern layer on the substrate and configured to form a refractive index distribution to exhibit a certain phase delay profile with respect to light in a visible spectrum,
the nanopattern layer comprising a crystalline compound having a refractive index greater than 3 with reference to the light in the visible spectrum and having a height of 2 microns or less from a surface of the substrate,
wherein the nanopattern layer includes,
a high refractive index pattern comprising the crystalline compound; and
a low refractive index pattern comprising a material having a refractive index less than that of the crystalline compound,
wherein the low refractive index pattern comprises a plurality of nanopillars,
wherein the high refractive index pattern surrounds the plurality of nanopillars, and
wherein the high refractive index pattern comprises a selective epitaxial layer of the crystalline compound selectively around the plurality of nanopillars.