US 12,152,316 B1
Passivation of nonlinear optical crystals
Yung-Ho Alex Chuang, Cupertino, CA (US); and Vladimir Dribinski, Scotts Valley, CA (US)
Assigned to KLA Corporation, Milpitas, CA (US)
Filed by KLA Corporation, Milpitas, CA (US)
Filed on Nov. 22, 2021, as Appl. No. 17/532,685.
Application 17/532,685 is a division of application No. 14/248,045, filed on Apr. 8, 2014, granted, now 11,180,866.
Claims priority of provisional application 61/810,605, filed on Apr. 10, 2013.
Int. Cl. C30B 33/02 (2006.01); C30B 7/00 (2006.01); C30B 9/00 (2006.01); C30B 29/10 (2006.01); C30B 29/22 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G01N 21/84 (2006.01); G01N 21/87 (2006.01)
CPC C30B 33/02 (2013.01) [C30B 7/00 (2013.01); C30B 9/00 (2013.01); C30B 29/10 (2013.01); C30B 29/22 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G01N 2021/8477 (2013.01); G01N 21/87 (2013.01); Y10T 117/1016 (2015.01); Y10T 117/1024 (2015.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
growing a fluorine-doped borate-based nonlinear optical crystal from a melt containing an atomic percent of fluorine of 5-20% of the atomic percentage of boron in the melt to inhibit incorporation of OH into the fluorine-doped borate-based nonlinear optical crystal, wherein the fluorine-doped borate-based nonlinear optical crystal comprises at least one of cesium borate (CBO) or cesium lithium borate (CLBO);
mechanically preparing the fluorine-doped borate-based nonlinear optical crystal;
performing an annealing process on the fluorine-doped borate-based nonlinear optical crystal to heat the fluorine-doped borate-based nonlinear optical crystal to drive OH content out of the fluorine-doped borate-based nonlinear optical crystal; and
exposing the fluorine-doped borate-based nonlinear optical crystal to a passivating gas comprising at least one of deuterium mixed with one or more inert gases or a deuterium-containing compound mixed with one or more inert gases, wherein the at least one of deuterium or the deuterium-containing compound of the passivating gas has a selected concentration in a range of 5 to 10%.