US 12,152,187 B2
Nitride etchant composition and method
Eric Hong, Bundang (KR); SeongJin Hong, Cheongju (KR); WonLae Kim, Gunpo (KR); JeongYeol Yang, Gunpo (KR); SeungHyun Chae, Gunpo (KR); and JuHee Yeo, Suwon (KR)
Assigned to ENTEGRIS, INC., Billerica, MA (US)
Filed by ENTEGRIS, INC., Billerica, MA (US)
Filed on Aug. 13, 2021, as Appl. No. 17/402,126.
Claims priority of provisional application 63/065,035, filed on Aug. 13, 2020.
Prior Publication US 2022/0049160 A1, Feb. 17, 2022
Int. Cl. C09K 13/08 (2006.01); H01L 21/306 (2006.01)
CPC C09K 13/08 (2013.01) [H01L 21/30604 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A composition comprising:
a. water;
b. at least one oxidizing agent;
c. at least one fluoride containing etchant;
d. 4-(3-phenylpropyl)pyridine and 5-methyl benzotriazole;
e. at least one pH adjustor selected from the group consisting of methane sulfonic acid, ethane sulfonic acid, phosphoric acid, sulfuric acid, and hydrogen chloride; and
optionally
f. at least one water-miscible solvent.