US 12,484,351 B2
Display device including an auxiliary layer
Jae-Bum Han, Suwon-si (KR); Young Gil Park, Asan-si (KR); Jung Hwa Park, Hwaseong-si (KR); Na Ri Ahn, Seongnam-si (KR); Soo Im Jeong, Hwaseong-si (KR); Ki Nam Kim, Hwaseong-si (KR); and Moon Sung Kim, Anyang-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Yongin-si (KR)
Filed by SAMSUNG DISPLAY CO., LTD., Yongin-si (KR)
Filed on Apr. 22, 2024, as Appl. No. 18/641,481.
Application 18/641,481 is a continuation of application No. 17/843,052, filed on Jun. 17, 2022, granted, now 11,967,669.
Application 17/843,052 is a continuation of application No. 16/941,102, filed on Jul. 28, 2020, granted, now 11,367,815, issued on Jun. 21, 2022.
Claims priority of application No. 10-2019-0107688 (KR), filed on Aug. 30, 2019.
Prior Publication US 2024/0379918 A1, Nov. 14, 2024
Int. Cl. H01L 33/58 (2010.01); H01L 27/12 (2006.01); H01L 29/24 (2006.01); H10D 62/80 (2025.01); H10D 86/40 (2025.01); H10D 86/60 (2025.01); H10H 20/832 (2025.01); H10H 20/855 (2025.01)
CPC H10H 20/855 (2025.01) [H10D 62/80 (2025.01); H10D 86/423 (2025.01); H10D 86/431 (2025.01); H10D 86/60 (2025.01); H10H 20/832 (2025.01)] 16 Claims
OG exemplary drawing
 
1. A display device, comprising:
a substrate;
a second semiconductor layer disposed on the substrate, the second semiconductor layer including Si;
a second gate lower electrode overlaps a channel region of the second semiconductor layer;
a second gate insulating layer disposed on the second gate lower electrode;
a second gate upper electrode and an electrode disposed on the second gate insulating layer;
a first auxiliary layer disposed on the second gate upper electrode and the electrode;
a first semiconductor layer overlaps the electrode, the first semiconductor layer includes an oxide semiconductor; and
a first gate electrode overlaps a channel region of the first semiconductor layer,
wherein the first auxiliary layer includes SiNx:F, and
the second gate upper electrode and the electrode are disposed on the same layer.