| CPC H10F 39/1843 (2025.01) [H04N 25/63 (2023.01); H04N 25/77 (2023.01); H04N 25/79 (2023.01); H10F 39/182 (2025.01); H10F 39/8037 (2025.01); H10F 39/8053 (2025.01); H10F 39/807 (2025.01)] | 19 Claims |

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1. A solid-state imaging device including:
a plurality of pixels arranged in a matrix, wherein
each of the pixels includes
a first semiconductor layer,
a photoelectric conversion section disposed on the first semiconductor layer on a side of a first surface,
an accumulation electrode disposed on the first semiconductor layer close to a side of a second surface on a side opposite to the first surface,
a wiring extending from the second surface of the first semiconductor layer,
a floating diffusion region connected to the first semiconductor layer via the wiring,
a first gate that forms a potential barrier in a charge flow path from the first semiconductor layer to the floating diffusion region via the wiring, where the first gate is a fixed charge film having a same polarity as a polarity of a charge generated by photoelectric conversion by the photoelectric conversion section.
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