| CPC H01L 21/6833 (2013.01) [H01J 37/32715 (2013.01); H01J 2237/0041 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/20235 (2013.01)] | 21 Claims |
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11. A system comprising:
a process chamber; and
a substrate support mounted in the process chamber, the substrate support comprising:
a plurality of clamp electrodes to electrostatically secure a substrate during a process;
one or more components to actively discharge a residual charge from the substrate after completion of the process, the one or more components comprising at least one of:
one or more conductive lift pins to contact a backside of the substrate; or
one or more light sources to expose the substrate to ultraviolet light; and
a plurality of lift pins to lift the substrate off of the substrate support after discharging the residual charge, wherein the plurality of lift pins comprise the one or more conductive lift pins; and
a controller, wherein the controller is configured to:
partially raise the plurality of lift pins to a first height;
measure, using a pressure sensor, a force exerted on of the substrate after partially raising the plurality of lift pins;
determine whether the force exceeds a force threshold; and
responsive to determining that the force exceeds the force threshold, cause the residual charge to be further discharged before raising the plurality of lift pins to a second height.
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