| CPC H01L 21/67103 (2013.01) [H01L 21/324 (2013.01); H01L 21/67092 (2013.01)] | 20 Claims |

|
1. An apparatus for heating a substrate, said apparatus comprising:
i) a heater;
ii) a substrate holder having a substrate holder surface, wherein the substrate to be heated can be placed on the substrate holder surface;
iii means for exerting forces on the heater; and
iv) a control unit for controlling the means for exerting forces, wherein the heater is deformable by the means for exerting forces,
wherein, due to deformation of the heater effected by the means for exerting forces, the deformation of the heater caused by external forces can be offset.
|