US 12,482,671 B2
Gas flow accelerator to prevent buildup of processing byproduct in a main pumping line of a semiconductor processing tool
Sheng-chun Yang, Tainan (TW); Chih-Lung Cheng, Tainan (TW); Yi-Ming Lin, Tainan (TW); Po-Chih Huang, Tainan (TW); Yu-Hsiang Juan, Taichung (TW); and Xuan-Yang Zheng, Tainan (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed on Apr. 1, 2024, as Appl. No. 18/623,347.
Application 18/623,347 is a division of application No. 16/947,422, filed on Jul. 31, 2020, granted, now 11,972,957.
Prior Publication US 2024/0258123 A1, Aug. 1, 2024
Int. Cl. C23C 16/44 (2006.01); C23C 8/24 (2006.01); C23C 14/50 (2006.01); C23C 16/458 (2006.01); F15D 1/02 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01)
CPC H01L 21/67017 (2013.01) [C23C 8/24 (2013.01); C23C 14/50 (2013.01); C23C 16/4401 (2013.01); C23C 16/4412 (2013.01); C23C 16/4583 (2013.01); C23C 16/4586 (2013.01); F15D 1/025 (2013.01); H01J 37/32715 (2013.01); H01J 37/32807 (2013.01); H01J 37/32816 (2013.01); H01J 37/32834 (2013.01); H01L 21/6838 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A gas flow accelerator, comprising:
a cylindrical body portion;
a tapered cylindrical body portion including a first end integrally formed with the cylindrical body portion;
an inlet port connected to the cylindrical body portion and configured to receive a process gas to be removed from a process chamber body of a semiconductor processing tool by a main pumping line,
wherein the semiconductor processing tool includes a chuck provided within the process chamber body and a chuck vacuum line connected to the chuck and configured to apply a vacuum to the chuck to retain a semiconductor device against the chuck,
wherein the tapered cylindrical body portion is configured to prevent buildup of processing byproduct on interior walls of the main pumping line;
an outlet port integrally formed with a second end of the tapered cylindrical body portion; and
a pressure relief port connected to the cylindrical body portion,
wherein a portion of the chuck vacuum line is provided through the pressure relief port and the outlet port.