US 12,481,216 B2
Photoresist composition, optical film thereof, and preparing method of the optical film
Hao Lun Huang, Taoyuan (TW); and Yi Sheng Wu, Taoyuan (TW)
Assigned to eChem Solutions Corp., Taoyuan (TW)
Filed by eChem Solutions Corp., Taoyuan (TW)
Filed on Feb. 25, 2022, as Appl. No. 17/680,358.
Claims priority of application No. 110107008 (TW), filed on Feb. 26, 2021.
Prior Publication US 2022/0276556 A1, Sep. 1, 2022
Int. Cl. G03F 7/033 (2006.01); G03F 7/00 (2006.01)
CPC G03F 7/033 (2013.01) [G03F 7/0005 (2013.01)] 18 Claims
 
1. A photoresist composition for low-temperature processes, comprising:
an (A) alkali soluble resin;
a (B) photopolymerizable compound;
a (C) photoinitiator;
a (D) thermal initiator; wherein the (D) thermal initiator is capable of releasing strong acids at a temperature;
a (E) black colorant; wherein the (E) black colorant is an organic black colorant consisting of at least one organic black pigment selected from a group consisting of lactam black, aniline black, and perylene black pigments; and
a (F) solvent,
wherein the (B) photopolymerizable compound comprises at least one ethylenically unsaturated monomer and at least one epoxy compound;
wherein a weight ratio of the at least one ethylenically unsaturated monomer to the at least one epoxy compound is between 1:5 and 5:1;
wherein the ethylenically unsaturated monomer is selected from the group consisting of polyethyleneglycol mono(meth)acrylate, polypropyleneglycol mono(meth)acrylate, phenoxyethyl(meth)acrylate, polyethyleneglycol(meth)acrylate, polypropyleneglycol(meth)acrylate, trimethylolethane triacrylate, trimethylolpropane triacrylate, neopentylglycol(meth)acrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, and
the at least one epoxy compound further has a structure represented by Formula (II), wherein R′ and R″ in Formula (II) are the same or different from each other, and each of R′ and R″ independently is hydrogen, hydroxyl group, C1-C10 alkyl group, C1-C10 alkoxyl group or —(Ra)n—Rb, and at least one of R′ and R″ is —(Ra)n—Rb; wherein Ra is hydrogen, C1-C10 alkylidene group, —R5—O—R6— or —R7—C(═O)O—R8—, and R5-R8 are the same or different from each other, and each of R5-R8 independently is C1-C10 alkylidene group; wherein Rb is hydrogen, sulfhydryl group, isocyanate group, carboxyl group, hydroxyl group, amino group, carbamido group, carbamate group, (methyl)acrylate group, C1-C10 alkyl group, C1-C10 alkoxyl group, C3-C15 cycloalkyl group, C3-C15 heterocycloalkyl group, C6-C20 aryl group or C5-C20 heteroaryl group; wherein x is an integer of 1-500; wherein y is an integer of 1-500; wherein n is an integer of 0 or 1;
(R′SiO1.5)x(R″SiO1.5)y   (II);
wherein the strong acid released from the thermal initiator is capable of catalyzing a crosslinking reaction of the at least one epoxy group of the at least one epoxy compound;
wherein the low-temperature is less than or equal to 150° C., and
the photoresist composition for low-temperature processes is adapted for making an optical film, and the optical film made from the photoresist composition for low-temperature processes has:
a transmittance of less than or equal to 2% for a light with a wavelength of 380 to 700 nm and a transmittance of greater than or equal to 80% for a light with a wavelength of 850 nm and a light with a wavelength of 940 nm;
an OD value of greater than or equal to 3.0;
chemical resistance, wherein the optical film has no residual color after being wiped with alcohol 50 times back and forth; and
mechanical properties, wherein the optical film has a semi-automatic pencil hardness of greater than or equal to 3H.