| CPC G02B 21/0032 (2013.01) [G02B 21/0036 (2013.01); G02B 21/008 (2013.01); G02B 21/361 (2013.01); G02B 21/365 (2013.01); H04N 23/10 (2023.01); H04N 23/56 (2023.01)] | 14 Claims |
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1. A sample observation device, comprising:
an irradiation optical system configured to emit first planar light and second planar light having different wavelengths so as to pass through cross sections at different positions of a sample;
a scanner configured to scan the sample with respect to a first irradiation surface by the first planar light and a second irradiation surface by the second planar light;
an imaging optical system having an observation axis inclined with respect to the first irradiation surface and the second irradiation surface and imaging each of a light image of first observation light generated in the sample by irradiation with the first planar light and a light image of second observation light generated in the sample by irradiation with the second planar light;
an image sensor configured to acquire first image data corresponding to the light image of the first observation light imaged by the imaging optical system and second image data corresponding to the light image of the second observation light during scanning of the sample by the scanner; and
an image generator configured to generate observation image data of the sample on a basis of the first image data and the second image data, wherein
when a width direction of the planar light is an X axis, a scanning direction of the sample is a Y axis, and an optical axis of the planar light is a Z axis,
a distance between the first planar light and the second planar light in the Y axis direction is L,
an observation depth of the planar light in the Z axis direction is D,
an inclination angle of the observation axis is θ′, and
L≥D×tan θ′.
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