US 12,480,864 B2
Methods for creating a trench in a sample, and computer program product
Heiko Stegmann, Dresden (DE)
Assigned to Carl Zeiss Microscopy GmbH, Jena (DE)
Filed by Carl Zeiss Microscopy GmbH, Jena (DE)
Filed on Dec. 7, 2023, as Appl. No. 18/532,516.
Claims priority of application No. 10 2022 132 705.1 (DE), filed on Dec. 8, 2022.
Prior Publication US 2024/0192124 A1, Jun. 13, 2024
Int. Cl. G01N 21/03 (2006.01); G01N 21/71 (2006.01); G01N 23/2251 (2018.01)
CPC G01N 21/03 (2013.01) [G01N 21/718 (2013.01); G01N 23/2251 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of creating a trench with an intended trench depth in a sample by ablating material from the sample using a particle beam created by a particle beam system, the method comprising:
defining a particle beam system setting which is a setting of the particle beam system used to implement an ablation unit step with the particle beam;
using the defined particle beam system setting on a calibration sample to acquire calibration data records;
determining a regression curve based on the acquired calibration data records, wherein the regression curve is defined based on a parameter that characterizes the ablation unit step;
determining an implementation number based on the determined regression curve and the intended trench depth; and
creating a trench in the sample by repeatedly implementing the ablation unit step with the defined particle beam system setting in accordance with the determined implementation number.