US 12,480,211 B2
Oxygen-doped amorphous carbon film and method for depositing the same
Seong-Pyo Cho, Yongin-si (KR); Seung-Hwan Jeon, Yongin-si (KR); and Nam-Seo Kim, Yongin-si (KR)
Assigned to TES CO., LTD, Yongin-si (KR)
Filed by TES Co., Ltd, Yongin-si (KR)
Filed on Feb. 5, 2024, as Appl. No. 18/432,288.
Claims priority of application No. 10-2023-0015128 (KR), filed on Feb. 3, 2023.
Prior Publication US 2024/0263311 A1, Aug. 8, 2024
Int. Cl. C23C 16/50 (2006.01); C23C 16/26 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01)
CPC C23C 16/50 (2013.01) [C23C 16/26 (2013.01); C23C 16/4408 (2013.01); C23C 16/45565 (2013.01); C23C 16/52 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A method for depositing an amorphous carbon film, the method comprising:
(a) loading a substrate into a process chamber;
(b) vacuumizing an inner space of the process chamber; and
(c) converting hydrocarbon gas into plasma in the process chamber to deposit an amorphous carbon film on the substrate,
wherein in the step (c), an oxygen-containing source is converted into plasma to dope oxygen into the deposited amorphous carbon film,
wherein the hydrocarbon gas and the oxygen-containing source contact each other in a space between a showerhead and a susceptor.