US 12,479,872 B2
Molybdenum(IV) and molybdenum(III) precursors for deposition of molybdenum films
Andrea Leoncini, Singapore (SG); Paul Mehlmann, Singapore (SG); Nemanja Dordevic, Singapore (SG); Han Vinh Huynh, Singapore (SG); and Doreen Wei Ying Yong, Singapore (SG)
Assigned to Applied Materials, Inc., Santa Clara, CA (US); and National University of Singapore, Singapore (SG)
Filed by Applied Materials, Inc., Santa Clara, CA (US); and National University of Singapore, Singapore (SG)
Filed on Jun. 16, 2022, as Appl. No. 17/841,963.
Application 17/841,963 is a division of application No. 17/146,683, filed on Jan. 12, 2021, granted, now 11,459,347.
Prior Publication US 2022/0306662 A1, Sep. 29, 2022
Int. Cl. C07F 11/00 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01)
CPC C07F 11/00 (2013.01) [C23C 16/18 (2013.01); C23C 16/45534 (2013.01); C23C 16/45553 (2013.01)] 16 Claims
 
1. A method of depositing a film, the method comprising:
exposing a substrate to a molybdenum(IV) precursor or a molybdenum(III) precursor having a structure of Formula (I):

OG Complex Work Unit Chemistry
wherein L is independently selected from the group consisting of pyrazolo, pyrazolato, guanidino, and iminato; and
exposing the substrate to a reactant to form a molybdenum-containing film on the substrate.