US 12,478,922 B2
Catalytic decomposition device and integrated waste gas treatment system
Kyeongmin Baek, Hwaseong-si (KR); Sungmin Jang, Suwon-si (KR); Seongkeun Kang, Hwaseong-si (KR); Taehyun Kim, Asan-si (KR); Seongyun Ryu, Asan-si (KR); Byungku Yoo, Hwaseong-si (KR); Seungjun Lee, Hwaseong-si (KR); Woosung Choi, Goyang-si (KR); Haeyong Choi, Yongin-si (KR); and Joungwoo Han, Hwaseong-si (KR)
Assigned to SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed by SAMSUNG ELECTRONICS CO., LTD., Suwon-si (KR)
Filed on Oct. 13, 2022, as Appl. No. 18/046,495.
Claims priority of application No. 10-2021-0163467 (KR), filed on Nov. 24, 2021.
Prior Publication US 2023/0158453 A1, May 25, 2023
Int. Cl. B01D 53/86 (2006.01); B01D 53/06 (2006.01); B01D 53/72 (2006.01); B01D 53/75 (2006.01); B01D 53/88 (2006.01); B01J 35/56 (2024.01); B01D 53/04 (2006.01); B01D 53/83 (2006.01); B01J 23/89 (2006.01)
CPC B01D 53/8631 (2013.01) [B01D 53/72 (2013.01); B01D 53/75 (2013.01); B01D 53/8634 (2013.01); B01D 53/8668 (2013.01); B01D 53/88 (2013.01); B01J 35/56 (2024.01); B01D 53/0407 (2013.01); B01D 53/0462 (2013.01); B01D 53/06 (2013.01); B01D 53/83 (2013.01); B01D 53/8621 (2013.01); B01D 53/8628 (2013.01); B01D 2253/102 (2013.01); B01D 2253/104 (2013.01); B01D 2253/108 (2013.01); B01D 2253/3425 (2013.01); B01D 2255/9022 (2013.01); B01D 2257/40 (2013.01); B01D 2257/406 (2013.01); B01D 2257/708 (2013.01); B01D 2258/0216 (2013.01); B01J 23/89 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An integrated waste gas treatment system, comprising:
an adsorption/desorption device configured to:
receive a waste gas that includes an organic compound and ammonia exhausted from a semiconductor manufacturing facility,
adsorb the organic compound and the ammonia, and
concentrate and desorb the organic compound and the ammonia; and
a catalytic decomposition device disposed adjacent to the adsorption/desorption device,
wherein the catalytic decomposition device includes:
a catalytic chamber having a gas passage through which a gas desorbed from the adsorption/desorption device flows; and
an oxidation-reduction catalyst disposed in the gas passage and configured to remove the organic compound and the ammonia from the desorbed gas,
wherein the catalytic decomposition device is configured such that the organic compound and the ammonia are subjected to an oxidation treatment by the oxidation-reduction catalyst, and nitrogen oxides (NOx) generated by the oxidation treatment are removed by a selective reduction reaction.